| Title |
New Selective Tungsten Deposition Process by the alternating Cyclic Hydrogen Reduction of WF_6 using LPCVD |
| Authors |
신동렬 ; Arnold Reisman(Arnold Reisman) ; Christopher Berry(Christopher Berry) ; 성영권 |
| Abstract |
New selective tungsyen deposition deposition on silicon process is described which makes use of a previously unreported, alternating cyclic, |